Join us in SPIE, 23 – 27 February 2025, in San Jose, California, US.
Short Course: Scatterometry in Profile, Overlay and Focus Process Control
Hugo Cramer – ASML Netherlands B.V. (Netherlands) and Igor Turovets – Nova Ltd. (Israel)
Course SC1100
23 February 2025, 1:30 PM – 5:30 PM PST
Mark your calendars to assure that you join our partner’s lecture:
Critical In-Line OCD Metrology for CFET Manufacturing (13426-4)
Hyukyun Kwon, imec (Belgium)
Conference 13426: Metrology, Inspection, and Process Control | Session 2: Optical Metrology
24 February, 1:40 PM PST | Convention Center, Grand Ballroom 220B
Metrology-design co-optimization for BEOL dimensional characterization using scatterometry (13426-33)
Stefan Schoeche, IBM, Thomas J. Watson Research Ctr. (United States)
Conference 13426: Metrology, Inspection, and Process Control | Session 7: 3D Profile and Shape Metrology
26 February, 9:30 AM PST | Convention Center, Grand Ballroom 220B
Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps (13426-46)
Padraig R. Timoney, IBM, Thomas J. Watson Research Ctr. (United States)
Conference 13426: Metrology, Inspection, and Process Control | Session 10: Metrology for Advanced Logic
26 February, 4:30 PM PST | Convention Center, Grand Ballroom 220B
Challenges and responses of metrology technologies for the new wave of 3d NAND devices (13426-57)
Dongchul Ihm, Samsung Electronics Co Ltd (Korea)
Conference 13426: Metrology, Inspection, and Process Control | Session 12: Heterogeneous Integration and Advanced Packaging
27 February, 11:30 AM PST | Convention Center, Grand Ballroom 220B