Nova VERAFLEX® III+ LE-XRF system is a fourth-generation inline X-ray photoelectron spectroscopy (XPS) tool featuring hardware innovations to enhance thin-film metrology and process control. The system offers additional capabilities for simultaneous low energy X-ray fluorescence (LE-XRF) spectroscopy that expands the application space.
Why Nova VERAFLEX® III+ XF?
Nova VERAFLEX® III+ XF features a proprietary high-current electron gun that increases X-ray flux and delivers significantly higher precision and throughput. The system is designed for varied processing requirements with beam size tunability for on-pad or in-die measurement options. Together, these innovations result in improved sensitivity, precision and productivity for a wide range of applications.