Advanced Imaging

In addition to Nova’s specialty in spectral measurements, we also invest in assisting channels that support the main metrology module. As requirement for accuracy and speed becomes tougher with advancing technology nodes, the complexity of these channels increases. This includes advanced image processing algorithms, sophisticated navigational channels, and robust pattern recognition capabilities. To enable measurement of a required location with sub-micron-level positional accuracy, Nova also implements a combination of sophisticated hardware and software navigation aids together with highly advanced pattern recognition capabilities.

Advanced Imaging

Highlights and Benefits

High-End Navigation Channel

Robust Pattern Recognition

Micron-scale characterization image processing

High-End Navigation Channel

Robust Pattern Recognition

Micron-scale characterization image processing

High-End Navigation Channel

An in-situ navigation channel and advanced pattern recognition to enable highly accurate measurements at the required positions

Robust Pattern Recognition

Advanced pattern recognition algorithms to locate system position on each wafer and enable rapid sub-micron accuracy

Micron-scale characterization image processing

Advanced image processing algorithms allow improved precision in characterizing elements with known geometry, down to nanometric precision

Advanced Imaging technology

How Does it Work?

The optical resolution of typical optical microscopes is limited by light diffraction to micron-scale and above. Nova’s advanced image processing algorithms allow for greatly improved precision, significantly improving on these limitations, through prior knowledge on the measured layout. Combined with flexible, high-end HW allowing optimization of the image conditions and characteristics, accurate and reliable navigation is obtained.

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Press Releases

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

12 Oct, 2021
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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Authored by: Stefan Schoeche, Daniel Schmidt, Pádraig Timoney, Aron Cepler, Marjorie Cheng, and Igor Turovets
Authored by: Dong Chul Ihm, Eunpa Kim, Sang Hyun Han
Authored by: Hyukyun Kwon, Joey Hung, Adam Michal Urbanowicz, Ronen Urenski, Igor Turovets, Avron Ger, Thomas Tseng, Mohamed Saib, Janusz Bogdanowicz, Stephanie Melhem, Daisy Zhou, Yong Kong Siew, Debashish Basu, Anne-Laure Charley, Jason Reifsnider, Naoto Horiguchi, and Philippe Leray