Secondary Ion Mass Spectrometry (SIMS)
Nova METRION® leverages secondary ion mass spectrometry (SIMS) technology to provide information that no other inline metrology system can deliver. This includes direct, inline measurement of chemical composition at high depth resolution and data density, as well as simultaneous measurement of multiple species throughout a 300mm wafer’s film stack. Process automation with built-in film analysis and recipe management makes the Nova METRION® system easy to use, while performing these measurements in the production fab shortens time to results.
Why Inline SIMS?
Delivering time-sensitive information needed to monitor and control high-volume manufacturing (HVM) workflows, inline SIMS prevents scrap, reduces rework, and enables tighter statistical process control (SPC).