Measure the Invisible to Provide Deep Process Insight
Nova offers a comprehensive suite of dimensional, materials, and chemical metrology solutions combined with advanced modeling and machine learning. These enable semiconductor manufacturers to gain deeper insight throughout the production process, increase yield, and shorten time to market.
Translate Metrology Data
into Concise Insight
Nova’s integrated and standalone optical metrology platforms for optical critical dimensions (CD) and thin film measurements, increase productivity, reliability and accuracy for the manufacturing of the most advanced semiconductor technology nodes.
In-Line Materials Metrology for Semiconductor Manufacturing
Nova’s highly sensitive materials metrology, designed and proven for high-volume manufacturing in-line process control enable critical metrology solutions to enhance device functionality and manufacturing yield, while shortening time to results.
Nova’s advanced, open and flexible chemical metrology solutions carry out chemical analysis and replenishment in real time to ensure high-quality electroplating processes for front-end metallization, backend packaging, IC substrate and high-end PCB processes.
Pursuing Insights to
Simplify Complex Problems
Nova’s comprehensive software modeling solutions combine top-notch algorithms in the field of artificial intelligence, physical, geometrical and data- driven machine-learning modeling solutions, supported by a computational management layer, and centralized fleet Management and control. This comprehensive suite addresses the full gamut of modeling and application development needs for the most advanced technology nodes.
Global support services dedicated to your sucess
Nova’s Global Services is structured to support you through a product’s lifecycle, guide you towards your goal of achieving and maintaining high-quality yields, and meeting special metrology requirements