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Authored by: Sasmita Srichandan, Franz Heider, Georg Ehrentraut, Stephan Lilje, Christian Putzi, Sanja Radosavljevic, Egidijus Sakalauskas
Authored by: Hyunwoo Ryoo*a, Seul Ji Songb, Min Ji Jeona, Juhyun Moonb, JiHye Leea, ByungHyun Hwanga, Jeongho Ahna, Yoon-jong Songb, Hidong Kwaka, Lior Neemanc, Noga Meirc, Jaehong Jangd, Ik Hwan Kimd, Hyunkyu Kimd
Authored by: Stefan Schoeche*a, Katherine Siega, Daniel Schmidta, Mohsen Nasseria, Shogo Mochizukia, Marinus Hopstakenb, Yaguang Zhuc, Li Xiangc, Julia Hoffmanc, Daniel Lewellync, Paul Isbesterc, and Sarah Okadac
Authored by: Jaesuk Yoona, Jongmin Parka, Minjung Shina, and Dongchul Ihma, Oshrat Bismuthb, Smadar Ferberb, Jacob Ofekb, Igor Turovetsb, Isaac Kim, aFlash Process Development Team MI, Samsung R&D Center, Hwaseong, Korea, NOVA Ltd, Rehovot, Israel, Nova Measuring Instruments Korea Ltd., Gyeonggi-do, Korea.
Authored by: Jun Chen, Xinheng Jiang, Keisuke Goto, Takashi Tsutsumi, Yasutaka Toyoda Hitachi High-tech Corp.,
Authored by: Stefan Schoeche, Daniel Schmidt, Junwon Han, Shahid Butt, Katherine Sieg, Marjorie Cheng, Aron Cepler, Shaked Dror, Jacob Ofek, Ilya Osherov, and Igor Turovetsc IBM Research, 257 Fuller Road, Albany, NY 12203, USA Nova Measuring Instruments Inc., 3342 Gateway Blvd, Fremont, CA 94538, USA Nova Ltd., 5 David Fikes St., Rehovot, 7632805, Israel