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Publication
OCD Enhanced: Implementation and Validation of Spectral Interferometry for Nanosheet Inner Spacer Indentation
D. Schmidt, C. Durfee, S. Pancharatnam, M. Medikonda, A. Greene, J. Frougier, A. Cepler, G. Belkin, D. Shafir, R. Koret, R. Shtainman, I. Turovets, S. Wolfling
February 1, 2021
SPIE 2021
Publication
Scatterometry Solutions for 14nm Half-Pitch BEOL Layers Patterned by EUV Single Exposure
Sayantan Das, Joey Hung, Sandip Halder, Roy Koret, Igor Turovets, Anne- Laure Charley, Philippe Leray
February 1, 2021
SPIE 2021
Publication
In-line Raman Spectroscopy for Stacked Nanosheet Device Manufacturing
D. Schmidt, C. Durfee, J. Li, N. Loubet, A. Cepler, L. Neeman, N. Meir, J. Ofek, Y. Oren, D. Fishman
February 1, 2021
SPIE 2021
Publication
Spectroscopy: a New Route Towards Critical-Dimension Metrology of the Cavity Etch of Nanosheet Transistors
J. Bogdanowicz, Y. Oniki, K. Kenis, Y. Muraki, T. Nuytten, S. Sergeant, A. Franquet, V. Spampinato, T. Conard, I. Hoflijk, J. Meersschaut, N. Claessens, A. Moussa, D. Van Den Heuvel, J. Hung, R. Koret, A.-L. Charley, P. Leray,
February 1, 2021
SPIE 2021
Publication
Ultra Large Pitch and Depth Structures Metrology Using Spectral Reflectometry in Combination with RCWA Based Model and TLM Algorithm
Ilya Osherov, Adam Michal Urbanowicz, Yinon Katz, Kobi Barkan, Igor Turovets, Ronny Haupt
May 1, 2020
ASMC 2020
Publication
Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
Dexin Kong, Daniel Schmidt, Mary Breton, Abraham Arceo de la peña, Julien Frougier, Andrew Greene, Jingyun Zhang, Veeraraghavan Basker, Nicolas Loubet, Ishtiaq Ahsan, Aron Cepler, Mark Klare, Marjorie Cheng, Roy Koret, Igor Turovets
May 1, 2020
ASMC 2020
Publication
Plasma Halogenated a-C:H as Growth Inhibiting Layer for ASD of Titanium Oxide
M. Krishtab, J. Hung, R. Koret, I. Turovets, K. Shah, S. Rangarajan, L. Warad, V. Zhang, R. Ameloot, S. Armini
February 1, 2020
SPIE 2020
Publication
Advanced Machine Learning Ecosystem to Address HVM Optical Metrology Requirements
Padraig Timoney, Roma Luthra, Alex Elia, Haibo Liu, Paul Isbester, Avi Levy, Michael Shifrin, Barak Bringoltz, Eylon Rabinovich, Ariel Broitman, Eitan Rothstein, Ran Yacoby, Ilya Rubinovich, YongHa Kim, Ofer Shlagman, Barak Ben-Nahum, Marina Zolkin, Igor Turovets
February 1, 2020
SPIE 2020
Publication
Measuring Local CD Uniformity in EUV vias with Scatterometry and Machine Learning
Dexin Kong, Daniel Schmidt, Jennifer Church, Chi-Chun Liu, Mary Breton, Cody Murray, Eric Miller, Luciana Meli, John Sporre, Nelson Felix, Ishtiaq Ahsan, Aron J. Cepler, Marjorie Cheng, Roy Koret, Igor Turovets
February 1, 2020
SPIE 2020
Publication
Ruthenium Direct Etch Scatterometry Solution for Self-Aligning Semi-Damascene
Paolillo, Sara, Moussa, Alain, Murdoch, Gayle, Lazzarino, Frederic, Charley, Anne-Laure, et al.
February 1, 2020
SPIE 2020
Publication
Improving Metrology Fleet KPIs for Advanced Foundry Manufacturing
Susan Emans, Benny Vilge, Marjorie Cheng, Charles Kang, Darren Zingerman, Kevin Drayton, Naren Yellai, Matthew Sendelbach, Taher Kagalwala, Padraig Timoney, Ronald Fiege, Jason Emans, Timothy Hughes, Alexander Elia, Alok Vaid
May 1, 2019
ASMC 2019
Publication
Advanced Optical Modeling of Thin Metals for Improved Robustness and Accuracy of Scatterometric Models
Carsten Hartig1, Adam M. Urbanowicz2, Dmitriy Likhachev1, Ines Altendorf1, Andreas Reichel1, Martin Weisheit1
May 1, 2019
ASMC 2019
Publication
Scatterometry and AFM Measurement Combination for Area Selective Deposition Process Characterization
Mohamed Saib, Alain Moussa, Anne-Laure Charley, Philippe Leray, Joey Hung, Roy Koret, Igor Turovets, Avron Ger, Shaoren Deng, Andrea Illiberi, Jan Willem Maes, Gabriel Woodworth, Michael Strauss
February 1, 2019
SPIE 2019
Publication
Machine Learning for Predictive Electrical Performance Using OCD
Sayantan Das, Joey Hung, Sandip Halder, Guillaume Schelcher, Roy Koret, Igor Turovets, Mohamed Saib, Anne-Laure Charley, Matthew Sandelbach, Avron Ger, Philippe Leray
February 1, 2019
SPIE 2019
Publication
Machine Learning and Hybrid Metrology Using Scatterometry and LE-XRF to Detect Voids in Copper Lines
Dexin Kong, Koichi Motoyama, Abraham Arceo de la peña, Huai Huang, Brock Mendoza, Mary Breton, Gangadhara Raja Muthinti, Hosadurga Shobha, Liying Jiang, Juntao Li, James J. Demarest, John Gaudiello, Gauri Karve, Aron Cepler, Matthew Sendelbach, Susan Emans, Paul Isbester, Kavita Shah, Shay Wolfing, Avron Ger
February 1, 2019
SPIE 2019
Publication
Full Structure Transistor Process Monitoring of Boron and Germanium in PFET EPI Using in-line XPS
Jusang Lee, Ganesh Subramanian, Manasa Medikonda, Hossam Lazkani, Judson Holt, Churamani Gaire, Paul Isbester, Mark Klare
February 1, 2019
SPIE 2019
Publication
Application of Scatterometry-Based Machine Learning to Control Multiple Electron Beam Lithography
Nivea Figueiro, Francisco Sanchez, Roy Koret, Michael Shifrin, Yoav Etzioni, Shay Wolfling, Matthew Sendelbach, Yoann Blancquaert, Thibault Labbaye, Guido Rademaker, Jonathan Pradelles, Lucie Mourier, Stephane Rey, Laurent Pain
May 1, 2018
ASMC 2018
Publication
Implementation of Machine Learning for High-Volume Manufacturing Metrology Challenges
Padraig Timoney, Taher Kagalwala, Edward Reis, Houssam Lazkani, Jonathan Hurley, Haibo Liu, Charles Kang, Paul Isbester, Naren Yellai, Michael Shifrin, Yoav Etzioni
February 1, 2018
SPIE 2018
Publication
Context-Based Virtual Metrology
Peter Ebersbach, Adam M. Urbanowicz, Dmitriy Likhachev, Carsten Hartig, Michael Shifrin
February 1, 2018
SPIE 2018
Publication
A Holistic Metrology Sensitivity Study for Pattern Roughness Quantification on EUV Patterned Device Structures with Mask Design Induced Roughness
Shimon Levi, Ishai Swrtsband, Vladislav Kaplan, Ilan Englard, Kurt Ronse, Bogumila Kutrzeba-Kotowska , Gaoliang Dai, Frank Scholze, Kenslea Anne, Hayley Johanesen, Laurens Kwakman, Igor Turovets, Maxim Rabinovitch, Sven Krannich, Nikolai Kasper, Brid Connolly, Romy Wende, Markus Bender
February 1, 2018
SPIE 2018
Publication
Scatterometry for Gate-All-Around (GAA) Technology Enablement
Anne-Laure Charley 1, Hans Mertens 1, Naoto Horiguchi 1, Phillipe Leray 1, Matthew Sendelbach 2, Nivea Figueiró 3, Roy Koret 4, Shay Wolfling 4, Avron Ger 4 Christopher Hakala 5, Jason Arjavac
February 1, 2018
SPIE 2018
Publication
In-line Characterization of Nonselective SiGe Nodule Defects with Scatterometry Enabled by Machine Learning
Dexin Kong, Robin Chao, Mary Breton, Chi-chun Liu, Gangadhara Raja Muthinti, Soon-cheon Seo, Nicolas J. Loubet, Pietro Montanini, John Gaudiello, Veeraraghavan Basker, Aron Cepler, Susan Ng-Emans, Matthew Sendelbach, Itzik Kaplan, Gilad Barak, Daniel Schmidt, Julien Frougier
February 1, 2018
SPIE 2018
Publication
Application of advanced hybrid metrology method to Nanoimprint Lithography
Ilya Osherov a, Limor Issacharoff a, Oram Gedalia a, Koichi Wakamoto b, Matthew Sendelbach c, Masafumi Asano d
February 1, 2017
SPIE 2017
Publication
Scatterometry Control for Multiple Electron Beam Lithography
Yoann Blancquaert a, Nivea Figueiro b, Thibault Labbaye a, Francisco Sanchez b, Stephane Heraud b, Roy Koret c, Matthew Sendelbach d, Ralf Michel b, Shay Wolfling c, Stephane Rey a, Laurent Pain a
February 1, 2017
SPIE 2017
Publication
Materials Characterization for Process Integration of Multi-Channel Gate All Around (GAA) Devices
Gangadhara Raja Muthinti a, Nicolas Loubet a, Robin Chao a, Abraham A. de la Peña a, Juntao Li a, Michael A. Guillorn a, Tenko Yamashita a, Sivananda Kanakasabapathy a, John Gaudiello a, Aron J. Cepler b, Matthew Sendelbach b, Susan Emans b, Shay Wolfling c, Avon Ger c, Daniel Kandel c, Roy Koret c, Wei Ti Lee d, Peter Gin e, Kevin Matney e, Matthew Wormington e
February 1, 2017
SPIE 2017
Publication
Electrical Test Prediction Using Hybrid Metrology and Machine Learning
Mary Breton a, Robin Chao a, Gangadhara Raja Muthinti a, Abraham A. de la Peña a, Jacques Simon a, Aron J. Cepler b, Matthew Sendelbach b, John Gaudiello a, Hao Tang a, Susan Emans b, Michael Shifrin c, Yoav Etzioni c, Ronen Urenski c, Wei Ti Lee d
February 1, 2017
SPIE 2017
Publication
Complex Metrology on 3D Structures Using Multi-Channel OCD
Taher Kagalwalaa, Sridhar Mahendrakara, Alok Vaida, Paul K. Isbesterb, Aron Ceplerb, Charles Kangb, Naren Yellaib, Matthew Sendelbachb, Mihael Koc, Ovadia Ilgayevc, Yinon Katzc, Lilach Tamamc, Ilya Osherovc
February 1, 2017
SPIE 2017
Publication
Hybrid Scatterometry Measurement for BEOL Process Control
Padraig Timoneya*, Alok Vaida Byung Cheol Kangb, Haibo Liub, Paul Isbesterb, Marjorie Chengb, Susan Ng-Emansb, Naren Yellaib, Matt Sendelbachb, Roy Koretc, Oram Gedaliac
February 1, 2017
SPIE 2017
Publication
Advanced Optical Modeling of TiN Metal Hard Mask for Scatterometric Critical Dimension Metrology
Peter Ebersbacha, Adam M. Urbanowiczb, Dmitriy Likhacheva, Carsten Hartiga
February 1, 2017
SPIE 2017
Publication
Scatterometry for Gate-All-Around (GAA) Technology Enablement
Anne-Laure Charley 1, Hans Mertens 1, Naoto Horiguchi 1, Phillipe Leray 1, Matthew Sendelbach 2, Nivea Figueiró 3, Roy Koret 4, Shay Wolfling 4, Avron Ger 4 Christopher Hakala 5, Jason Arjavac 5
February 1, 2017
SPIE 2017