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Authored by: Jaesuk Yoona, Jongmin Parka, Minjung Shina, and Dongchul Ihma, Oshrat Bismuthb, Smadar Ferberb, Jacob Ofekb, Igor Turovetsb, Isaac Kim, aFlash Process Development Team MI, Samsung R&D Center, Hwaseong, Korea, NOVA Ltd, Rehovot, Israel, Nova Measuring Instruments Korea Ltd., Gyeonggi-do, Korea.
Authored by: Jun Chen, Xinheng Jiang, Keisuke Goto, Takashi Tsutsumi, Yasutaka Toyoda Hitachi High-tech Corp.,
Authored by: Stefan Schoeche, Daniel Schmidt, Junwon Han, Shahid Butt, Katherine Sieg, Marjorie Cheng, Aron Cepler, Shaked Dror, Jacob Ofek, Ilya Osherov, and Igor Turovetsc IBM Research, 257 Fuller Road, Albany, NY 12203, USA Nova Measuring Instruments Inc., 3342 Gateway Blvd, Fremont, CA 94538, USA Nova Ltd., 5 David Fikes St., Rehovot, 7632805, Israel
Authored by: Authored by: Daniel SchmidtiD ,a,* Manasa Medikonda,a Michael Rizzolo,a Claire Silvestre,a Julien Frougier,a Andrew Greene,a Mary Breton,a Aron Cepler,b Jacob Ofek,c Itzik Kaplan,c Roy Koret,c and Igor Turovetsc