Technologies Overview Chemical Metrology
Cyclic Voltammetric Stripping (CVS)

Cyclic Voltammetric Stripping (CVS)

Nova’s chemical metrology products utilize cyclic voltammetric stripping (CVS) technology. CVS is an electrochemical method for measuring the concentration of organic additives in galvanic plating baths in order to deposit metals or alloys for interconnects and bumps on wafer structures. The additives are essential for optimizing the plating process and ensuring defect-free metallization.

 

With CVS techniques, metal is deposited by generating defined potential difference between the platinum rotating disk working electrode (WE) and a counter electrode (CE), in the presence of reference electrode (RE). Take, for example, the depositing of copper to a platinum rotating disk electrode followed by dissolving, or stripping, it back into the solution. The charge needed for the depositing process is measured and used for evaluation. The step is repeated several times under varying conditions, eventually leading to the organic additive concentration calculation, and delivering final measurement.

Cyclic Voltammetric Stripping (CVS)

Highlights and Benefits

Full Process Emulation

Low Maintenance

Durable

High Adaptability

Organic Additive Analysis

Full Process Emulation

Low Maintenance

Durable

High Adaptability

Organic Additive Analysis

Full Process Emulation

Emulates the entire plating process, rather than the determination of individual organic components, to consider the impact of all possible bath components

Low Maintenance

Patented long-life, maintenance-free reference electrode system

Durable

Features durable working electrodes and counter-electrodes.

High Adaptability

Adapts to many copper and non-copper bath types for frontend, back-end and PCB usage

Organic Additive Analysis

Available for organic additive analyses in non-copper bath types such as tin, tin-silver, cobalt, gold and nickel

Cyclic Voltammetric Stripping (CVS)

Multiple types of sweeps and scenarios of using CVS technique (the way and speed with which potential is varied during the measurement) are available for the analysis, and can deliver wide variety of plating process-relevant information, outside of simple concentration measurement. For example, CVS hardware setup can also be used for other voltammetric techniques such as bath plating condition and contaminant analysis.

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Press Releases

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ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

09 Feb, 2022
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Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

16 Nov, 2021
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Nova Completes Acquisition of ancosys

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25 Jan, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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