X-Ray Photoelectron Spectroscopy (XPS)
The Nova VERAFLEX® line of products leverages X-ray photoelectron spectroscopy (XPS). This powerful technology is optimized to provide the automation, speed and reliability required in today’s advanced semiconductor production environments. XPS is uniquely suited for the industry’s move to thinner films and smaller features, thereby improving performance at each new technology node. The Nova VERAFLEX® product suite has optimized various aspects of XPS to create an innovative inline metrology system that operates in an automated production environment.
Why XPS?
XPS is a surface-sensitive quantitative spectroscopic technique used to determine the elemental composition of thin films. The technique provides information about the chemical and electronic state of the elements existing within a thin film or a complex stack.
How it Works?
XPS spectra are obtained by exposing the film of interest to a primary X-ray, which can either be absorbed by the material or scattered through the material. If the X-ray is sufficiently energetic, it is absorbed and transfers energy to an inner shell electron. The emitted electrons maintain a specific kinetic energy that is representative of the chemical signature of the element. Analysis of this photoelectric effect is known as XPS.
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