Technologies Overview Materials Metrology
X-Ray Photoelectron Spectroscopy (XPS)

X-Ray Photoelectron Spectroscopy (XPS)

The Nova VERAFLEX® line of products leverages X-ray photoelectron spectroscopy (XPS). This powerful technology is optimized to provide the automation, speed and reliability required in today’s advanced semiconductor production environments. XPS is uniquely suited for the industry’s move to thinner films and smaller features, thereby improving performance at each new technology node. The Nova VERAFLEX® product suite has optimized various aspects of XPS to create an innovative inline metrology system that operates in an automated production environment.

X-Ray Photoelectron Spectroscopy (XPS)

Highlights and Benefits

Surface-Sensitive Technique

Accurate Chemical/Bonding State Identification

Direct Atom Quantification

Thickness and Composition Data

Surface-Sensitive Technique

Accurate Chemical/Bonding State Identification

Direct Atom Quantification

Thickness and Composition Data

Surface-Sensitive Technique

Implements surface-sensitive quantitative spectroscopic technique

Accurate Chemical/Bonding State Identification

Accurately identifies chemical element and bonding state based on emitted photoelectron energy

Direct Atom Quantification

Directly quantifies the number of atoms in the film resulting from photoelectron intensity analysis

Thickness and Composition Data

Delivers simultaneous, thickness and composition data without correlation

Nova ELIPSON®

Why XPS?

XPS is a surface-sensitive quantitative spectroscopic technique used to determine the elemental composition of thin films. The technique provides information about the chemical and electronic state of the elements existing within a thin film or a complex stack.

How it Works?

XPS spectra are obtained by exposing the film of interest to a primary X-ray, which can either be absorbed by the material or scattered through the material. If the X-ray is sufficiently energetic, it is absorbed and transfers energy to an inner shell electron. The emitted electrons maintain a specific kinetic energy that is representative of the chemical signature of the element. Analysis of this photoelectric effect is known as XPS.

Press Releases

Leading Analog Manufacturer Purchases Multiple Nova VERAFLEX® Tools

Leading Analog Manufacturer Purchases Multiple Nova VERAFLEX® Tools

07 Jul, 2022
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Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

12 Oct, 2021
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Nova Receives Multiple Materials Metrology Orders from Leading Logic and Foundry Customers

Nova Receives Multiple Materials Metrology Orders from Leading Logic and Foundry Customers

28 Jan, 2021
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TSV stress evolution mapping using in-line Raman spectroscopy
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