Nova METRION®
The first in-line SIMS for statistical process control (SPC) of compositional profiles
Meet Nova METRION®: a fully-automated SIMS product validated for in-line production process control. Nova METRION® takes repetitive measurements out of the lab and into the fab where the time-sensitive information is critical for SPC. Moving the capability into the fab, and enabling full-wafer mapping, shortens the time to feedback, and provides a quick ROI, by identifying process excursions when they occur, preventing scrap and expensive rework.
Highlights:
- SIMS technology enabling quantitative compositional profiling tailored for the fab
- Fully-automated, recipe-driven, 300mm HVM-ready
- Designed for process control of complex film stacks for logic and memory
- Fast, reliable, and repeatable SIMS data
- Validated on various high-value use cases for logic and memory
Nova’s METRION® system is an innovative SIMS platform designed from the ground up for seamless integration into an automated factory workflow. The system is engineered to deliver high-precision metrology results for process control of complex films stacks for both logic and memory devices. METRION® measures the precise concentration of chemical species as a function of depth, generating compositional profiles that can be used to monitor and control various properties including dopant concentration, implant uniformity, and contamination levels.
