Nova METRION®

Traditionally, SIMS equipment has been available only in metrology laboratories. As device complexity and the variety of materials used have increased, the need for materials engineering has become more critical to device performance. Nova METRION is the only SIMS tool available for inline, quantitative compositional profiling that is tailored to the fab

Seamlessly integrates with automated factory workflows and is designed for inline HVM. This fully automated, recipe-driven system utilizes an oxygen primary ion beam that is safe for use in a 300mm production environment

Designed for process control of complex film stacks for logic and memory devices, the system provides quantitative compositional profiling directly in the production line, where results are immediately uploaded to the factory host. This enables SIMS data to be used for statistical process control (SPC) parameters, resulting in better process control

Performs SIMS measurements in the fab on multiple locations of a full 300mm wafer, rather than in the lab on coupons. This eliminates the need to take wafers outside the fab and break them, enables multi-point measurements for uniformity control, and shortens time to feedback. This means SIMS data can lead to early detection of process excursions, reducing scrap, increasing productivity and improving yield. The system provides fast, reliable and repeatable SIMS data within the fab

Several high-value applications for in-line SIMS have been validated by logic and memory device makers, including dopant concentration, implant control, process excursion prevention, chamber matching, and uniformity control