Nova Metrion®

First inline SIMS for SPC of compositional profiles

Nova Metrion®

Nova Metrion® is the first fully automated SIMS system validated for inline production process control. Enabling full-wafer mapping, Nova Metrion® shortens time to feedback and delivers rapid ROI by identifying process excursions in near-real time to prevent scrap and expensive rework.

Highlights and Benefits

In-line Compositional Profiling

HVM-Ready

Better Process Control

Faster Time to Feedback

Market Validation

In-line Compositional Profiling

HVM-Ready

Better Process Control

Faster Time to Feedback

Market Validation

In-line Compositional Profiling

Traditionally, SIMS equipment has been available only in metrology laboratories. As device complexity and the variety of materials used have increased, the need for materials engineering has become more critical to device performance. Nova Metrion is the only SIMS tool available for inline, quantitative compositional profiling that is tailored to the fab

HVM-Ready

Seamlessly integrates with automated factory workflows and is designed for inline HVM. This fully automated, recipe-driven system utilizes an oxygen primary ion beam that is safe for use in a 300mm production environment

Better Process Control

Designed for process control of complex film stacks for logic and memory devices, the system provides quantitative compositional profiling directly in the production line, where results are immediately uploaded to the factory host. This enables SIMS data to be used for statistical process control (SPC) parameters, resulting in better process control

Faster Time to Feedback

Performs SIMS measurements in the fab on multiple locations of a full 300mm wafer, rather than in the lab on coupons. This eliminates the need to take wafers outside the fab and break them, enables multi-point measurements for uniformity control, and shortens time to feedback. This means SIMS data can lead to early detection of process excursions, reducing scrap, increasing productivity and improving yield. The system provides fast, reliable and repeatable SIMS data within the fab

Market Validation

Several high-value applications for in-line SIMS have been validated by logic and memory device makers, including dopant concentration, implant control, process excursion prevention, chamber matching, and uniformity control

Nova Metrion®

Why Nova Metrion®?

Time-sensitive information is critical for statistical process control (SPC). Nova Metrion® uniquely addresses this need by carrying out repetitive measurements, typically done in the lab, within the fab itself.

An innovative SIMS platform designed from the ground up, Nova Metrion® enables seamless integration within automated factory workflows. The system is engineered to deliver high-precision metrology results for process control of complex films stacks for both logic and memory devices.

Measuring the precise concentration of chemical species as a function of depth, Nova Metrion® generates compositional profiles that can be used to monitor and control various important properties, including dopant concentration, implant uniformity, and contamination levels.

What is Nova Metrion®?

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Press Releases

Nova Metrion® Selected by Advanced Logic Manufacturer

Nova Metrion® Selected by Advanced Logic Manufacturer

12 Jul, 2022
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Nova Introduces Revolutionary Inline SIMS Solution

Nova Introduces Revolutionary Inline SIMS Solution

08 Dec, 2021
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Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

12 Oct, 2021
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Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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