Optical Scatterometry

Optical scatterometry characterizes unknown properties of a sample by measuring the reflection of broadband light. The reflection varies by wavelength (color), polarization and angle of incidence. Nova’s scatterometry tools deliver highly accurate measurements of a user-defined location at very high rate and small measurement spot. While speed, accuracy and spot size requirements are often contradictory, Nova enables their coexistence to keep pace with the constant demand for better metrology capabilities as technology node sizes continue to shrink.

Optical Scatterometry

Highlights and Benefits

High Measurement Speed

Non-Destructive Operation

Accurate Interpretation

High Measurement Speed

Non-Destructive Operation

Accurate Interpretation

High Measurement Speed

Leverages extremely strong light sources, highly sensitive detectors, high-transmission light path and fast wafer handling and motion solutions to enable fast measurement with a high signal-to-noise ratio

Non-Destructive Operation

Does not impact the sample during measurement

Accurate Interpretation

Utilizing a suite of algorithmic solutions, combining accurate rigorous light-matter modeling with advanced machine-learning solutions, accurate and robust interpretation of the measured signal is provided

Optical Scatterometry

Why Optical Scatterometry?

Typical dimensions measured by optical scatterometry are associated with state-of-the-art semiconductor structures (transistors, memory devices, interconnects and more). Even though typical dimensions reach orders-of-magnitude smaller scales than the wavelength of the light being used, optical scatterometry with its sophisticated analysis and interpretation methods covers this gap.

How it Works?

After a broadband light source is focused onto a sample, the reflected light is focused onto a device that separates the light into spectral and polarization components (represented schematically by a prism). Each component is then transformed into an electrical signal using a specialized detector. The spectral data (i.e. the signal level for each wavelength) is then delivered to a processing unit. Based on the physics describing how matter interacts with light (Maxwell’s equations) and machine learning mathematical models, the processing unit deduces the sample characteristics which best explain the measured spectra.

You Might Also Be Interested In

Nova– a Journey of Innovation

At Nova, a leading semiconductor metrology provider, innovation is a top value both as a strategy a...

Do What You Love and the Rest Will Follow: How Eli Meril’s...

  Meet Eli Meril, a Theoretical Physicist and Algorithm Developer who is part of the CTO-R&a...

Demonstrating a DNA of InNOVAtion

There are Infinite ways to innovate and Nova is known to cultivate an atmosphere of innovation, enc...

Press Releases

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

Global Logic Manufacturer Selects Nova’s Latest Materials Metrology Platform

12 Oct, 2021
Read More
IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
Read More

Our Publications

Filter By Years
2023
2022
2021
2020
2019
Authored by: Daniel Doutt*a, Ping-ju Chena, Bhargava Ravooria, Tuyen K. Trana, Eitan Rothsteinb, Nir Kampelb, Lilach Tamamb, Effi Aboodyb, Avron Gerb, Harindra Vedalac
TSV stress evolution mapping using in-line Raman spectroscopy
April 27 2023
@
SPIE Advanced Lithography + Patterning
Authored by: Stefan Schoeche, Daniel Schmidt, Marjorie Cheng, Aron Cepler, Abraham Arceo de la Pena, Jennifer Oakley
Authored by: A. Moussa, J. Bogdanowicz, B. Groven, P. Morin, M. Beggiato, M. Saib, G. Santoro, Y. Abramovitz, K. Houtchens, S. Ben Nissim, N. Meir, J. Hung, A. Urbanowicz, R. Koret, I. Turovets, G. F. Lorusso, A.-L. Charley
Authored by: Benjamin Hickey, Wei Ti Li, Sarah Okada, Lawrence Rooney, Feng Zhang
Authored by: Benjamin Hickey, Wei Ti Li, Sarah Okada, Lawrence Rooney, Feng Zhang
Authored by: Julia Hoffman, Sarah Okada, Lawrence Rooney, Bruno Schueler, Ganesh Vanamu