The Nova FIT® modeling solution is a state-of-the-art machine learning algorithms hub, maximizing signal information with an open platform for reference metrology. It leverages machine learning and data-driven algorithms to maximize the power of traditional modeling of optical critical dimensions (CD). Breaking the paradigm that productivity must impact precision, this user-friendly solution combines robust accuracy with minimized time to solution. Nova FIT® works with Nova MARS® physical modeling engine and Nova Fleet Management® to drive metrology performance, accelerate time to solution, and expand the metrology envelope for enriched process control.
Why Nova FIT®?
Nova was the first to introduce machine learning into metrology for IC production, and since then Nova FIT® has been adopted by the leading IC manufacturers. Today more than ever, manufacturers must reach beyond traditional modeling to enhance productivity and accuracy without sacrificing either. Nova FIT® embeds the most advanced data-driven and machine learning capabilities, as well as big data architectures into optical modeling. As such, the suite revolutionizes how customers utilize metrology measurement data to tighten process windows, avoid process excursions and improve yield.
The solution was designed to interface with other process control tools for accuracy improvement and shorter recipe development and control cycles.
The solution is empowered by Nova HPC, an advanced computational platform that optimizes Nova’s proprietary algorithm performance for the most calculation-demanding application developments.