Nova i550® is a cutting-edge integrated metrology platform that provides superior metrology performance for CMP and etch process control in the most advanced logic and memory technology nodes
Why Nova i550®?
Nova i550® is designed to meet the process control challenges of the most advanced R&D developments and production lines. With new optics providing wider spectral information, a smaller pad size, and advanced pattern recognition to optimally support unique modeling algorithms, Nova i550® offers the industry’s highest metrology accuracy, precision and tool matching capabilities.
Working in conjunction with the Nova MARS software application development platform, Nova i550® delivers advanced process control for the most advanced logic, 3D NAND double-deck structure, and advanced DRAM applications.
Addressing the need for high-performance metrology closer to the process, Nova i550® significantly boosts productivity. Qualified for integration with leading vendors’ CMP and etch process equipment, the solution enables high sampling and multi-site measurement schemes.
When supported by Nova’s central management, control and connectivity suite, Nova i550® offers even greater operational efficiency and advanced metrology control functionality.