Nova’s Advanced Performance IM solution
The Nova i550® is Nova’s cutting-edge integrated metrology platform that provides superior metrology performance for CMP and Etch process control in the most advanced logic and memory technology nodes.
Highlights and Benefits
- Best metrology performance with new optics and unique modeling
- High productivity IM tool
- Tight accuracy, precision, and Tool-to- Tool matching specs
- Integration with leading process tools
The Nova i550® is designed to meet the process control challenges in the most advanced R&D and production lines. With new optics that provide wider spectral information, smaller pad size, advanced pattern recognition that optimally support unique modeling algorithms, the Nova i550® delivers the best metrology accuracy, precision and tool matching.
Addressing the need for high-performance metrology that is closer to the process, the Nova i550® platform provides a significant boost in productivity that enables high sampling, multi-site measurement schemes and is qualified for integration with leading CMP and Etch process equipment vendors.
The Nova i550® platform is supported by Nova’s central management, control and connectivity suite for boosted operational efficiency and advanced metrology control functionality.