Nova i550®

Advanced performance IM solution

Nova i550®

Nova i550® is a cutting-edge integrated metrology platform that provides superior metrology performance for CMP and etch process control in the most advanced logic and memory technology nodes

Highlights and Benefits

Best Metrology Performance

Direct Device Measurements

Highest Productivity

Best Metrology Performance

Direct Device Measurements

Highest Productivity

Best Metrology Performance

Unique hardware and modeling capabilities that enable enhanced metrology performance

Direct Device Measurements

Measures logic and memory in-die structures, including complex 1D, 2D, 3D and direct devices

Highest Productivity

Faster throughput delivers better productivity

Nova Prism

Why Nova i550®?

Nova i550® is designed to meet the process control challenges of the most advanced R&D developments and production lines. With new optics providing wider spectral information, a smaller pad size, and advanced pattern recognition to optimally support unique modeling algorithms, Nova i550® offers the industry’s highest metrology accuracy, precision and tool matching capabilities.

Working in conjunction with the Nova MARS software application development platform, Nova i550® delivers advanced process control for the most advanced logic, 3D NAND double-deck structure, and advanced DRAM applications.

Addressing the need for high-performance metrology closer to the process, Nova i550® significantly boosts productivity. Qualified for integration with leading vendors’ CMP and etch process equipment, the solution enables high sampling and multi-site measurement schemes.

When supported by Nova’s central management, control and connectivity suite, Nova i550® offers even greater operational efficiency and advanced metrology control functionality.

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Press Releases

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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