Events and Presentations

SPIE Advanced Lithography 2019

  • 24-02-2019 - 28-02-2019
  • San Jose Convention Center, CA, USA

SPIE Advanced Lithography is the leading global lithography event that draws more than 2,200 attendees, 50 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. 

We're proud to return as conference 10959 sponsor: "Metrology, Inspection, and Process Control for Microlithography XXXIII".
You are cordially invited to attend the talks involving Nova technology and customer collaboration. Please check out Nova's agenda:

  • Session 3 - Challenges and New Methods
    "Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines",  Dexin Kong, IBM Corp. (USA); [10959-9]
    February 25th at 4:00 PM
  • Session 4 - Inspection I
    "Machine learning for predictive electrical performance using OCD", Sayantan Das, IMEC (Belgium); [10959-14]
    February 26th at 08:40 AM
  • Session 5 - Advances in Physical Characterization
    "Full structure transistor process monitoring of boron and germanium in PFET EPI using In-line XPS", Jusang Lee, Ganesh, GLOBALFOUNDRIES (USA); [10959-21]
    February 26th at 11:30 AM
  • Session 13 - Process Control
    "Scatterometry and AFM measurement combination for area selective deposition process characterization", Mohamed Saib, IMEC (Belgium);  [10959-57]
    February 28th at 10:50 AM
  • Short Course: 
    Scatterometry in Profile, Overlay and Focus Process Control [SC1100]
    Instructors: Hugo Cramer, ASML Netherlands B.V. (Netherlands); Igor Turovets, Nova Measuring Instruments Ltd. (Israel)
    February 24th,  1:30 PM - 5:30 PM