Join the lecture by Infinion about: Usage of OCD with ML for deep trenches depth and bottom CD

Join a lecture by imec’s Janusz Bogdanowicz about: “Three-dimensional gate-all-around semiconductor devices: a new realm for metrology” in the Advanced Characterization of Materials session on May 30 at 8:45.

Our Research Scientist, Yovav Kalifon, will hold a lecture about: Raman Spectroscopy Machine-Learning Approach for Inline Application in the Semiconductor Industry, on May 28 at 09:45.

Join our Materials Metrology Division General Manager, Adrian Wilson for a lecture on: “The use of Artificial Intelligence and Machine learning in soft X-ray technology for Advanced Semiconductor Process Development and Control”

Join Dr. Shay Wolfling, Nova’s CTO in his insightful lecture about: Advanced and future logic device architectures: challenges and solutions in materials metrology

April 17 | 16:00

Join us in an enlightening lecture by our own John Mc Manus, NOva’s application engineer, about: Enabling Higher Resolution Measurement to Support Zone Control .

The lecture will take place on April 16th at 2:00 PM

Join Dr. Roy Pinhassi, Product Marketing Manager, in his insightful lecture:  Doping level detection in Si or SiGe via In-Line Raman Spectroscopy.

Unique spectral interferometry solutions for complex high aspect ratio 3D NAND structures (12955-60)
Session 12 | Jaesuk Yoon, SAMSUNG (Korea)
29 February, 4:00 PM

Spectral interferometry for TSV metrology in chiplet technology (12955-56)
Session 11 | Stefan Schoeche, IBM (USA)
29 February, 2:10 PM       

From lab to fab: In-line SIMS for process control in Nanosheet Gate-All-Around device manufacturing (12955-7) 
Session 2 | Stefan Schoeche, IBM (USA)
26 February, 4:30 PM         

On-cell thickness monitoring of chalcogenide alloy layer using spectral interferometry, Raman spectroscopy, and hybrid machine learning (12955-14) 
Session 3 | Hyunwoo Ryoo, SAMSUNG (Korea)
27 February, 11:20 AM