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SPIE 2026

SPIE 2026

February 22-26, 2026
San Jose, California, USA

Join us at SPIE 2026 where the following presentations will be held:

  1. The Art of Holistic Metrology (in memory of Alok Vaid) by Igor Turovets, Nova Ltd 

CONFERENCE 13981, Metrology, Inspection, and Process Control XL

SESSION 1: Hybrid And Virtual Metrology

23 February, 1:30 PM PST | Convention Center, Grand Ballroom 220B
2.

In-line XPS for advanced semiconductor manufacturing and metrology on fully integrated targets by Christopher J. Lee, IBM Research – Albany (US)

CONFERENCE 13981 Metrology, Inspection, and Process Control XL

SESSION 2 Metrology And Inspection For Advanced Logic Devices

23 February, 4:20 PM PST | Convention Center, Grand Ballroom 220B

3. Model-based Raman simulations for optimized metrology in nanosheet transistor devices by Stefan Schoeche, IBM Research – Albany (US)

CONFERENCE 13981 Metrology, Inspection, and Process Control XL

SESSION 3 Modeling And Data Analysis

24 February, 9:50 AM PST | Convention Center, Grand Ballroom 220B

4.

In-line monitoring of hybrid bonding Cu recess by combining interpolated reference metrology and OCD machine learning by Padraig R. Timoney, IBM Research – Albany (US)

CONFERENCE 13981 Metrology, Inspection, and Process Control XL

SESSION 4 Heterogeneous Integration And Advanced Packaging

24 February, 10:50 AM PST | Convention Center, Grand Ballroom 220B

5. In-line XPS metrology for area selective deposition processes on patterned structures by Manasa Medikonda, IBM Research – Albany (US)

CONFERENCE 13981 Metrology, Inspection, and Process Control XL

SESSION 7 X-Ray Metrology And Inspection

25 February, 9:30 AM PST | Convention Center, Grand Ballroom 220B

6. Evaluation of In-line SIMS impact on device reliability and performance

Poster Session

25 February 2026, 5:30 PM PST

Jander Cruz, IBM Research – Albany (US)

7. Integrated High-Resolution Edge Metrology for Enhanced CMP Process Control

Poster Session

25 February 2026, 5:30 PM PST

Cornel Bozdog, Micron Technology, Inc. (US)

 

8. SC1100 Scatterometry in Profile, Overlay and Focus Process Control

Course SC1100

22 February 2026, 1:30 PM PST

Hugo Cramer, ASML Netherlands B.V. (Netherlands) & Igor Turovets, Nova Ltd. (Israel)