SPIE Advanced Lithography

Join us: 

SESSION 7: New Methods: Student Session

Tuesday February 25 | 3:30 PM TO 5:10 PM

Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide (11325-27)

Authors: Mikhail Krishtab, KU Leuven (Belgium) and imec (Belgium); Rob Ameloot, KU Leuven (Belgium); Silvia Armini, imec (Belgium); Joey Hung, Nova Measuring Instruments Inc. (USA); Roy Koret, Igor Turovets, Nova Measuring Instruments Ltd. (Israel); Kavita Shah, Srinivasan Rangarajan, Laxmi Warad, Vanessa Zhang, Nova Measuring Instruments Inc. (USA)

SESSION 9: Scatterometry
Wednesday February 26 | 10:30 AM TO 12:10 PM
Ruthenium direct etch scatterometry solution for self-aligning semi-damascene (11325-36)

Authors: Sara Paolillo, Alain Moussa, Gayle Murdoch, Frederic Lazzarino, Anne-Laure Charley, Philippe Leray, imec (Belgium); Roy Koret, Nova Measuring Instruments Ltd. (Israel); Joey Hung, Nova Measuring Instruments Ltd. (Germany); Igor Turovets, Shay Wolfling, Avron Ger, Nova Measuring Instruments Ltd. (Israel)

SESSION 10: Machine Learning
Wednesday February 26 | 1:40 PM TO 3:00 PM

Advanced machine learning eco-system to address HVM optical metrology requirements (11325-42)
Authors: Padraig R. Timoney, Roma Luthra, Alex Elia, GLOBALFOUNDRIES Inc. (USA); Haibo Liu, Paul K. Isbester, Avi Levy, Nova Measuring Instruments Inc. (USA); Michael Shifrin, Barak Bringoltz, Ariel Broitman, Eitan Rothstein, Nova Measuring Instruments Ltd. (Israel)

Measuring local CD uniformity in EUV vias with scatterometry and machine learning (11325-43)

Authors: Dexin Kong, Daniel Schmidt, Jennifer Church, Chi-Chun Liu, Mary A. Breton, Cody Murray, Luciana Meli, Liying Jiang, John Sporre, Nelson Felix, Ishtiaq Ahsan, IBM Thomas J. Watson Research Ctr. (USA); Aron J. Cepler, Marjorie Cheng, Nova Measuring Instruments Inc. (USA); Roy Koret, Igor Turovets, Nova Measuring Instruments Ltd. (Israel)