Join Roy Pinhassi, Product Marketing Manager, in his lecture about; EARLY FAULT-ANALYSIS USING IN-LINE RAMAN SPECTROSCOPY
Join our VP Strategic Marketing, Sang Hyun Han, in his lecture about: Metrology and defect Inspection challenges and solutions for advanced nodes
Make sure to watch Infineon’s lecture about: Machine Learning for Deep Trench Bottom CD Measurements using Scatterometrometry
Join our team of metrology experts in their lectures by clicking on this link: https://ewh.ieee.org/conf/edtm/2023/index.html link
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In-line SIMS Enables Better SiGe Epi Process Control for Nanosheets, by Sarah Okada, Product Marketing Director
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Process Control Challenges and Solutions for Advanced Semiconductor Devices, by Yun Jung Jee, Regional Marketing Director
Please join us and our partners to the following lectures:
27 February, 3:40 PM: Full wafer OCD metrology: Increasing the sampling rate without the cost of ownership penalty by Bhargava Ravoori, Intel Corp. (USA)
Session 3 | Optical Metrology
27 February, 4:20 PM: TSV strain evolution mapping using in-line Raman spectroscopy by Stefan Schoeche, IBM Thomas J. Watson Research Ctr. (USA)
Session 3 | Optical Metrology
2 March, 3:40 PM: 300mm in-line metrologies for the characterization of ultra-thin layer of 2D materials by Alain Moussa, imec (Belgium)
Session 14 | Late Breaking News
Don’t miss the opportunity to attend a Short Course about: Scatterometry in Profile, Overlay and Focus Process Control
Instructors: Hugo Cramer, ASML Netherlands B.V. (Netherlands), Igor Turovets, Nova Ltd (Israel)
February 26 | 1:30-5:30 PM