Products Overview
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Chemical Metrology
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Nova AncoFlex® 

Nova AncoFlex™

Fully automated analysis for PCB and IC-substrate manufacturing environments

Nova AncoFlex™

Nova AncoFlex® is an industry-standard fully automated inline chemical metrology solution for copper PCB and IC-substrate production processes. The solution supports a continuously growing range of copper baths and applications and provides excellent lifetime monitoring of bath composition and performance. The platform combines reported and controlled accuracy and precision with uncompromising reliability and the highest availability.

Highlights and Benefits

Fully Automated

Low Cost of Ownership

Data Access

Network Integration

Smaller Footprint

Fully Automated

Low Cost of Ownership

Data Access

Network Integration

Smaller Footprint

Fully Automated

Automates process analysis and carries out self-monitoring and diagnostics for failure detection via automatic validation and calibration

Low Cost of Ownership

High reliability with minimal service needs and long parts lifetimes for a low cost of ownership

Data Access

Maintains complete access to collected data for better characterization, troubleshooting, and process improvement

Network Integration

Communicates with all plating tools, and fully integrates with the fab communications network

Smaller Footprint

Optimally designed to require only front access for reduced required fab space

What is Nova AncoFlex®

Related Products and Technologies

Nova DMR®
Nova AncoScene®
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Press Releases

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

09 Feb, 2022
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Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

16 Nov, 2021
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Nova Completes Acquisition of ancosys

Nova Completes Acquisition of ancosys

25 Jan, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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