Technologies Overview Chemical Metrology
High-Performance Liquid Chromatography (HPLC)

High-Performance Liquid Chromatography (HPLC)

Nova’s chemical metrology product line leverages High-Performance Liquid Chromatography (HPLC), a mature quantitative analysis method.

High-Performance Liquid Chromatography (HPLC)

Highlights and Benefits

Fully Automated
Multi- Component Determination
Highest Precision
Multi-Component Detection
High Flexibility
Fully Automated
Multi- Component Determination
Highest Precision
Multi-Component Detection
High Flexibility
Fully Automated

Features a compact, fully automated workstation

Multi- Component Determination

Simultaneously determines multiple components in one run

Highest Precision

Offers the most precise organic component measurement method even at very low concentrations

Multi-Component Detection

Detects both known and unknown, including unexpected and undesired components, such as contaminants and breakdowns, which accumulate during the lifetime of the plating bath

High Flexibility

Maintains high flexibility due to numerous separation and detection principles

High-Performance Liquid Chromatography (HPLC)

HPLC is a technique whereby all relevant components are separated before being measured. At the beginning of the analysis, a small sample (10-100 µL) is delivered  into an HPLC column via the mobile or eluent phase. The sampled solution’s components interact with the stationary phase, passing through the column at different speeds depending on their level of interaction. The least interacting components move faster through the column (elute), while the stronger interacting components move slowly. A detector at the end of the column identifies the separated components. The detector’s signal is recorded and used to calculate the concentration of the analyzed components.

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Press Releases

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

01 Jan, 1970
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Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

01 Jan, 1970
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Nova Completes Acquisition of ancosys

Nova Completes Acquisition of ancosys

01 Jan, 1970
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

01 Jan, 1970
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Our Publications

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Authored by: Manasa Medikonda, Linda Wangoh, Christopher J. Lee, Mark Klare, Dimitry Kislitsyn, Heath Pois, Paul Isbester, Aron Cepler, Wei Ti Lee and Daniel Schmidt
Authored by: Christopher J. Lee, Manasa Medikonda, Trevor McDonough, Will Parkin, Ruqiang Bao, Paul Isbester, Mark Klare, and Daniel Schmidt
Authored by: Pádraig Timoney, Stefan Schoeche, Nick Polomoff, Joseph Mittelstaedt, Matt Malley, Tyler Sherwood, Emad Omrani, Daniel Schmidt, Aron Cepler, Paul Isbester, Igor Turovets
Authored by: Stefan Schoeche, Aron Cepler, Marjorie Cheng, Jander Cruz, Roy Koret, Lior Baltiansky, Maor Asher, Alexander Levy, Igor Turovets, and Daniel Schmidt
Authored by: Igor Turovets